LTO - SiO2 DEPOSITION IN A STAGNATION FLOW LPCVD SYSTEM

effect of sub-grid scales on large eddy simulation of particle deposition in a turbulent channel flow

چکیده ندارد.

Modelling and Experimental Study of Wax Deposition in Transportation Line Using a Flow Loop System

Momentum and thermal boundary-layer thickness in a stagnation flow chemical vapor deposition reactor

Explicit expressions have been derived for momentum and thermal boundary-layer thickness of the laminar, uniform stagnation flows characteristic of highly convective chemical vapor deposition pedestal reactors. Expressions for the velocity and temperature profiles within the boundary layers have also been obtained. The results indicate that, to leading order, the momentum boundary-layer thickne...

Comparison of deposition models for a TEOS LPCVD process

We present a comparison of models describing the pyrolytic deposition of SiO2 with a low pressure chemical vapor deposition process. In order to meet industrial simulation requirements, e.g. accuracy and fast delivery of results, we present an overview of established and new models, their use within TCAD applications, and their best results which have been obtained by calibrations according to ...

Oscillatory Flow Near a Stagnation Point

The classical Hiemenz solution describes incompressible two-dimensional stagnation point flow at a solid wall. We consider an unsteady version of this problem, examining particularly the response close to the wall when the solution at infinity is modulated in time by a periodic factor of specified amplitude and frequency. While this problem has already been tackled in the literature for general...